As a designer I am fascinated by the fundamental concept of symmetry and its varied interdisciplinary applications. My recent work explores the possibilities of extending repeating patterns beyond the two dimensional plane.
This work explores the relationship of line, pattern, form and structure. The fabric is etched with a p4m geometric design before being folded with crease lines, which correspond with certain pattern symmetries, to create form. In Fold #1, the crease pattern motif corresponds to four unit cells of the underlying p4m etched pattern. The mountain folds correspond with glide reflection axes in the etched pattern and the valley folds with axes of reflection. Centres of four-fold rotation are located at the centre, corners and midpoints of each edge in the crease pattern motif, which translates to create the overall structure.
In Fold #2, the crease pattern motif corresponds to four unit cells of the underlying p4g etched pattern. The mountain folds correspond with glide reflection axes in the etched pattern running through the four-fold axes at the centres and corners of the crease pattern motif. Valley folds correspond with the edges of the crease pattern motif connecting centres of four-fold rotation.